UV/H2O2/O3高级氧化技术降解藻源NDMA前体物特性研究

作者:宋武昌 杜振齐 李桂芳 姚振兴 孙韶华 王永磊 贾瑞宝
单位:山东省城市供排水水质监测中心 山东建筑大学
摘要:对比了UV、H2O2和O3氧化技术及UV/H2O2/O3高级氧化技术对藻源NDMA前体物的去除效果,并使用BBD响应曲面法进行了参数优化。结果表明UV及H2O2氧化会增加NDMA前体物含量,O3氧化仅在高投加量情况下对NDMA前体物有一定去除效果,UV/H2O2/O3技术可有效降解藻源NDMA前体物;响应曲面法优化结果表明,各因素对试验结果影响程度的顺序为:UV剂量>O3投加量>H2O2投加量,UV/H2O2/O3技术去除藻源NDMA前体物最佳工况参数为:UV剂量293mJ/cm2、O3投加量0.31mg/L、H2O2投加量1.21mg/L,经验证该模型准确可靠。
关键词:高级氧化UV/H2O2/O3组合技术亚硝基二甲胺响应曲面法
作者简介:贾瑞宝,男,1968年出生,工学博士,研究员(工程技术二级),主要研究方向为饮用水安全保障领域的关键技术研发和工程应用研究。
基金:国家水体污染控制与治理科技重大专项
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Degradation of NDMA precursor from algae by UV/H2O2/O3 advanced oxidation technology
SONG Wuchang DU Zhenqi LI Guifang YAO Zhenxing SUN Shaohua WANG Yonglei JIA Ruibao
(Shandong Province (Jinan) Water Supply and Drainage Monitoring Center Shandong Jianzhu University)
Abstract: The removal efficiency of NDMA precursor from algae by UV,H2O2 and O3 oxidation alone and UV/H2O2/O3 advanced oxidation technology was compared,and the parameters were optimized by BBD response surface method.The results showed that UV and H2O2 oxidation technology could increase the content of NDMA precursor,while O3 oxidation only had a certain removal effect on NDMA precursor at high dosage,and UV/H2O2/O3 technology could effectively degrade NDMA precursor from algae.The results of response surface optimization showed that the order of the influence degree of each factor on the experimental results was:UV dose>O3 dosage>H2O2 dosage.The optimal parameters of the UV/H2O2/O3 technology for the removal of NDMA precursor from algae were:293mJ/cm2 of UV dose,0.31mg/L of O3 dosage,1.21mg/L of H2O2 dosage,the model was verified to be accurate and reliable.
Keywords: Advanced oxidation; UV/H2O2/O3combination; NDMA; Response surface methodology;
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