半导体厂房气态分子污染物控制探讨
摘要：气态分子污染物(AMC)越来越成为半导体厂房建设、运营过程中需要解决的主要问题之一。本文结合AMC控制原理、技术标准、实际工程经验、工厂运行数据、实验数据等简要阐述了半导体厂房对AMC的控制要求、废气排放高度对新风入口位置的影响、新风空调机组中水洗装置的设计要点、各种化学过滤器的性能参数，为同类项目的建设提供参考。
关键词：半导体厂房洁净室气态分子污染物水洗化学过滤器废气排放
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[4] TSAO Y C,CHANG P E,CHEN S Y,et al.Real-time fab-wise airborne molecular contaminant (AMC) monitoring system using multiple fourier transform infrared (FTIR) spectrometers in a semiconductor plant[J].Aerosol and air quality research,2015(15):1640- 1651.
[5] ASHRAE.2019 ASHRAE handbook:HVAC applications[M].Atlanta:ASHRAE Inc.,2019:826- 832.
[6] CHAO S M.Removal of inorganic gas contaminant by air-washer in make-up air units in cleanrooms[D].Taipei:Taipei University of Technology,2008:18- 24.
[7] INOUE M.Characteristics of wet-air clean system[C]//18th Annual Technology Meeting on Air Cleaning and Contamination Control,2000:54- 57.
[8] HSU W J.Application of air washer of make-up air units to remove acidic and basic gaseous molecular pollutants[D].Taoyuan:National Central University,2017:24- 29.
[9] HO J H.The analysis of ammonia gas removal efficiency by air-washer[D].Taichung:National Chin-Yi University of Technology,2010:24- 29.
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Reviews on control of airborne molecular contaminants in semiconductor plants
Abstract: Airborne molecular contaminants(AMC) have increasingly become one of the major problems to be solved in the construction and operation of semiconductor plants. This paper combines AMC control principles, technical standards, actual engineering experience, plant operation data, experimental data, etc., to briefly expound the control requirements of semiconductor plants for AMC, the influence of exhaust emission height on the position of outdoor air inlet, the design points of water washing devices in outdoor air conditioning units, and the performance parameters of various chemical filters, so as to provide references for the construction of similar projects.
Keywords: semiconductor plant; clean room; airborne molecular contaminant; air washing; chemical filter; exhaust emission;
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